Rigorous electromagnetic simulation of mask magnification effects on the diffracted light for EUV binary mask

Chun Hung Lin*, Hsuen Li Chen, Fu-Hsiang Ko

*此作品的通信作者

研究成果: Article同行評審

3 引文 斯高帕斯(Scopus)

指紋

深入研究「Rigorous electromagnetic simulation of mask magnification effects on the diffracted light for EUV binary mask」主題。共同形成了獨特的指紋。

Keyphrases

Engineering

Material Science