Review composite and multilayer ferroelectric thin films: Processing, properties and applications

K. P. Jayadevan*, Tseung-Yuen Tseng

*此作品的通信作者

    研究成果: Review article同行評審

    59 引文 斯高帕斯(Scopus)

    摘要

    This paper reviews recent developments in processing, properties and applications of composite and multilayer ferroelectric thin films. Methods such as physical vapor deposition, chemical vapor deposition and sol-gel, for the processing of composite and multilayer ferroelectric films are described. Among the techniques reviewed for the fabrication of multilayer ferroelectric films, molecular beam epitaxy and atomic layer metal-organic chemical vapor deposition are the most suitable techniques for the deposition of superlattices with atomically sharp interface. As an efficient and quick way, pulsed-laser deposition has been widely used for the preparation of ferroelectric multilayers and heterostructures. Superior dielectric properties have been reported for sol-gel-derived micrometer-thick ceramic/ceramic composite ferroelectric films. Properties of multilayer ferroelectric films vary as a function of periodicity, which can be exploited for the development of various electronic devices. Enhanced characteristics of composite and multilayer films with selected examples from recent literature and the origin of enhancement are discussed and summarized. Finally, applications of the materials for the development of various electronic devices are also presented.

    原文American English
    頁(從 - 到)439-459
    頁數21
    期刊Journal of Materials Science: Materials in Electronics
    13
    發行號8
    DOIs
    出版狀態Published - 1 8月 2002

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