Relative stabilities of tetramethyl orthosilicate and tetraethyl orthosilicate in the gas phase

Jason C.S. Chu; James Breslin; Niann-Shiah Wang; Ming-Chang Lin

doi:10.1016/0167-577X(91)90170-B

Relative stabilities of tetramethyl orthosilicate and tetraethyl orthosilicate in the gas phase

Jason C.S. Chu, James Breslin, Niann-Shiah Wang, Ming-Chang Lin^*

^*此作品的通信作者

研究成果: Article › 同行評審

30 引文斯高帕斯（Scopus）

摘要

The stabilities of Si(OCH₃)₄ and Si(OC₂H₅)₄ have been studied pyrolytically using highly diluted mixtures near atmospheric-pressure conditions. FTIR spectrometric analyses of the disappearance of the reactants and the formation of various major stable products allow us to qualitatively account for the global difference in the measured overall first-order decay constants: TMOS is significantly more stable than TEOS. The mechanistic implication of these results is discussed.

原文	English
頁（從 - 到）	179-184
頁數	6
期刊	Materials Letters
卷	12
發行號	3
DOIs	https://doi.org/10.1016/0167-577X(91)90170-B
出版狀態	Published - 10月 1991

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10.1016/0167-577X(91)90170-B

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abstract = "The stabilities of Si(OCH3)4 and Si(OC2H5)4 have been studied pyrolytically using highly diluted mixtures near atmospheric-pressure conditions. FTIR spectrometric analyses of the disappearance of the reactants and the formation of various major stable products allow us to qualitatively account for the global difference in the measured overall first-order decay constants: TMOS is significantly more stable than TEOS. The mechanistic implication of these results is discussed.",

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AU - Breslin, James

AU - Wang, Niann-Shiah

AU - Lin, Ming-Chang

PY - 1991/10

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N2 - The stabilities of Si(OCH3)4 and Si(OC2H5)4 have been studied pyrolytically using highly diluted mixtures near atmospheric-pressure conditions. FTIR spectrometric analyses of the disappearance of the reactants and the formation of various major stable products allow us to qualitatively account for the global difference in the measured overall first-order decay constants: TMOS is significantly more stable than TEOS. The mechanistic implication of these results is discussed.

AB - The stabilities of Si(OCH3)4 and Si(OC2H5)4 have been studied pyrolytically using highly diluted mixtures near atmospheric-pressure conditions. FTIR spectrometric analyses of the disappearance of the reactants and the formation of various major stable products allow us to qualitatively account for the global difference in the measured overall first-order decay constants: TMOS is significantly more stable than TEOS. The mechanistic implication of these results is discussed.

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DO - 10.1016/0167-577X(91)90170-B

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ER -

Relative stabilities of tetramethyl orthosilicate and tetraethyl orthosilicate in the gas phase

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