Reduction of direct-tunneling gate leakage current in double-gate and ultra-thin body MOSFETs

Leland Chang*, Kevin J. Yang, Yee Chia Yeo, Yang Kyu Choi, Tsu Jae King, Chen-Ming Hu

*此作品的通信作者

研究成果: Conference article同行評審

28 引文 斯高帕斯(Scopus)

摘要

The impact of energy quantization on gate tunneling current is studied for double-gate and ultra-thin body MOSFETs. The lower vertical electric field in the channel of these thin-body devices causes a reduction in gate leakage by as much as an order of magnitude. The additional effects of channel doping and high-κ dielectrics are also investigated.

原文English
頁(從 - 到)99-102
頁數4
期刊Technical Digest - International Electron Devices Meeting
DOIs
出版狀態Published - 12月 2001
事件IEEE International Electron Devices Meeting IEDM 2001 - Washington, DC, 美國
持續時間: 2 12月 20015 12月 2001

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