摘要
The impact of energy quantization on gate tunneling current is studied for double-gate and ultra-thin body MOSFETs. The lower vertical electric field in the channel of these thin-body devices causes a reduction in gate leakage by as much as an order of magnitude. The additional effects of channel doping and high-κ dielectrics are also investigated.
原文 | English |
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頁(從 - 到) | 99-102 |
頁數 | 4 |
期刊 | Technical Digest - International Electron Devices Meeting |
DOIs | |
出版狀態 | Published - 12月 2001 |
事件 | IEEE International Electron Devices Meeting IEDM 2001 - Washington, DC, 美國 持續時間: 2 12月 2001 → 5 12月 2001 |