Quantitative analysis of SILCs (stress induced leakage currents) based on the inelastic trap-assisted tunneling model

Shiro Kamohara*, Yutaka Okuyama, Yukiko Manabe, Kosuke Okuyama, Katsuhiko Kubota, Donggun Park, Chen-Ming Hu

*此作品的通信作者

研究成果: Conference article同行評審

4 引文 斯高帕斯(Scopus)

摘要

We have successfully developed a new quantitative analytical ITAT (inelastic trap-assisted tunneling)-based SILC (stress induced leakage current) model which can explain both of the two field dependencies, i.e. Fowler-Nordheim (FN)-field and the direct tunneling (DT)-field dependence of A-mode and B-mode SILCs. White DT-field dependence of A-mode comes from the single trap assisted tunneling, FN-field dependence of B-mode originates at the tunneling via the multi-trap leakage path. We have also developed an analytical model for the anomalous SILC of the flash memory cell and investigate the properties of retention lifetime of failure bits. The anomalous SILC shows the DT-field dependence because of the tunneling via the incomplete multi-trap path. A remarkable behavior of retention characteristics predicted by our models is a nearly logarithmic time dependence. The Fowler-Nordheim tunneling model leads to an overestimation of lifetime at low Vth region. To take into account a position of each trap and clarify the detail characteristics of SILC, we have proposed a new Monte Carlo like approach for hopping conduction and successfully explained the anomalous SILC using only physical based parameters.

原文English
頁(從 - 到)206-214
頁數9
期刊Proceedings of SPIE - The International Society for Optical Engineering
3881
DOIs
出版狀態Published - 1 12月 1999
事件Proceedings of the 1999 Microelectronic Device Technology III - Santa Clara, CA, USA
持續時間: 22 9月 199923 9月 1999

指紋

深入研究「Quantitative analysis of SILCs (stress induced leakage currents) based on the inelastic trap-assisted tunneling model」主題。共同形成了獨特的指紋。

引用此