Properties of polycrystalline diamond as X-ray mask

Jeng-Tzong Sheu; G. Y. Yang; B. R. Huang

doi:10.1117/12.324054

Properties of polycrystalline diamond as X-ray mask

Jeng-Tzong Sheu^*, G. Y. Yang, B. R. Huang

^*此作品的通信作者

生醫工程研究所

研究成果: Conference article › 同行評審

2 引文斯高帕斯（Scopus）

摘要

1.5 μm thick polycrystalline diamond film was deposited using microwave plasma chemical vapor deposition (MPCVD) as x-ray mask membrane with 0.1 to approximately 0.25 μm seeding. The temperature is controlled between 820 to 830 degree Celsius and the ratios of CH₄/H₂ gas mixtures are varied for the quality and stress of the diamond film. The optical properties and radiation damage of the membrane will be demonstrated. Low tensile stress diamond membrane has been formed with backside KOH etching. Surface morphology was monitored by the AFM and the quality of the diamond film was measured by the Raman spectroscopy.

原文	English
頁（從 - 到）	173-175
頁數	3
期刊	Proceedings of SPIE - The International Society for Optical Engineering
卷	3512
DOIs	https://doi.org/10.1117/12.324054
出版狀態	Published - 1 12月 1998
事件	Proceedings of the 1998 Conference on Materials and Device Characterization in Micromachining - Santa Clara, CA, USA 持續時間: 21 9月 1998 → 22 9月 1998

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title = "Properties of polycrystalline diamond as X-ray mask",

abstract = "1.5 μm thick polycrystalline diamond film was deposited using microwave plasma chemical vapor deposition (MPCVD) as x-ray mask membrane with 0.1 to approximately 0.25 μm seeding. The temperature is controlled between 820 to 830 degree Celsius and the ratios of CH4/H2 gas mixtures are varied for the quality and stress of the diamond film. The optical properties and radiation damage of the membrane will be demonstrated. Low tensile stress diamond membrane has been formed with backside KOH etching. Surface morphology was monitored by the AFM and the quality of the diamond film was measured by the Raman spectroscopy.",

author = "Jeng-Tzong Sheu and Yang, {G. Y.} and Huang, {B. R.}",

year = "1998",

month = dec,

day = "1",

doi = "10.1117/12.324054",

language = "English",

volume = "3512",

pages = "173--175",

journal = "Proceedings of SPIE - The International Society for Optical Engineering",

issn = "0277-786X",

publisher = "SPIE",

note = "Proceedings of the 1998 Conference on Materials and Device Characterization in Micromachining ; Conference date: 21-09-1998 Through 22-09-1998",

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TY - JOUR

T1 - Properties of polycrystalline diamond as X-ray mask

AU - Sheu, Jeng-Tzong

AU - Yang, G. Y.

AU - Huang, B. R.

PY - 1998/12/1

Y1 - 1998/12/1

N2 - 1.5 μm thick polycrystalline diamond film was deposited using microwave plasma chemical vapor deposition (MPCVD) as x-ray mask membrane with 0.1 to approximately 0.25 μm seeding. The temperature is controlled between 820 to 830 degree Celsius and the ratios of CH4/H2 gas mixtures are varied for the quality and stress of the diamond film. The optical properties and radiation damage of the membrane will be demonstrated. Low tensile stress diamond membrane has been formed with backside KOH etching. Surface morphology was monitored by the AFM and the quality of the diamond film was measured by the Raman spectroscopy.

AB - 1.5 μm thick polycrystalline diamond film was deposited using microwave plasma chemical vapor deposition (MPCVD) as x-ray mask membrane with 0.1 to approximately 0.25 μm seeding. The temperature is controlled between 820 to 830 degree Celsius and the ratios of CH4/H2 gas mixtures are varied for the quality and stress of the diamond film. The optical properties and radiation damage of the membrane will be demonstrated. Low tensile stress diamond membrane has been formed with backside KOH etching. Surface morphology was monitored by the AFM and the quality of the diamond film was measured by the Raman spectroscopy.

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U2 - 10.1117/12.324054

DO - 10.1117/12.324054

M3 - Conference article

AN - SCOPUS:0032304039

SN - 0277-786X

VL - 3512

SP - 173

EP - 175

JO - Proceedings of SPIE - The International Society for Optical Engineering

JF - Proceedings of SPIE - The International Society for Optical Engineering

T2 - Proceedings of the 1998 Conference on Materials and Device Characterization in Micromachining

Y2 - 21 September 1998 through 22 September 1998

ER -

Properties of polycrystalline diamond as X-ray mask

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