摘要
Gated-Field-Emission Triode from the cone-tip formation process to its emission properties has been systematically characterized. Process simulation shows that the successful formation of the micro tip structure is mainly determined by the migration length of the e-beam evaporated layer. The measured triode characteristics matches well with the simulated program in the saturation region with proper tip radius adjustment without an artificial enhancement factor. The calculated enhancement factor matches well with other published data.
原文 | English |
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DOIs | |
出版狀態 | Published - 1994 |
事件 | 1994 International Electron Devices and Materials Symposium, EDMS 1994 - Hsinchu, 台灣 持續時間: 12 7月 1994 → 15 7月 1994 |
Conference
Conference | 1994 International Electron Devices and Materials Symposium, EDMS 1994 |
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國家/地區 | 台灣 |
城市 | Hsinchu |
期間 | 12/07/94 → 15/07/94 |