Preparation of nano-scale patterns on the silicon oxide surface by dip-pen nanolithography

Jeng-Tzong Sheu; C. H. Wu; H. H. Liu; Tien-Sheng Chao

doi:10.1109/NANO.2005.1500862

Preparation of nano-scale patterns on the silicon oxide surface by dip-pen nanolithography

Jeng-Tzong Sheu^*, C. H. Wu, H. H. Liu, Tien-Sheng Chao

^*此作品的通信作者

研究成果: Conference contribution › 同行評審

摘要

Dip-pen nanolithography (DPN), which uses an "inked" AFM tip to deposit organic molecules through a water meniscus onto an underlying substrate under ambient conditions, has been used to create N-(2-aminoethyl)-3-amino- propyl-trimethoxysilane (AEAPTMS) nano patterns as linkers for anchoring gold nanoparticles on the surface of SiO₂. In this study, conditions of DPN for organic patterns, AEAPTMS, with sub-100 nm dimensions are investigated. Moreover, gold nanoparticles with citrate-negativey-charged surface were deposited selectively on top of DPN orgainc patterns. Lateral force microscope (LFM) was utilized to differentiate different surface between oxidized semi-conductor surfaces and patterned areas with monolayer of AEAPTMS. Line-width as small as 60 nm has been successfully achieved by this method.

原文	English
主出版物標題	2005 5th IEEE Conference on Nanotechnology
頁面	895-898
頁數	4
DOIs	https://doi.org/10.1109/NANO.2005.1500862
出版狀態	Published - 1 12月 2005
事件	2005 5th IEEE Conference on Nanotechnology - Nagoya, 日本持續時間: 11 7月 2005 → 15 7月 2005

出版系列

名字	2005 5th IEEE Conference on Nanotechnology
卷	2

Conference

Conference	2005 5th IEEE Conference on Nanotechnology
國家/地區	日本
城市	Nagoya
期間	11/07/05 → 15/07/05

存取文件

10.1109/NANO.2005.1500862

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Link to publication in Scopus

引用此

@inproceedings{09b0befe1c7445d89efefa23de5de139,

title = "Preparation of nano-scale patterns on the silicon oxide surface by dip-pen nanolithography",

abstract = "Dip-pen nanolithography (DPN), which uses an {"}inked{"} AFM tip to deposit organic molecules through a water meniscus onto an underlying substrate under ambient conditions, has been used to create N-(2-aminoethyl)-3-amino- propyl-trimethoxysilane (AEAPTMS) nano patterns as linkers for anchoring gold nanoparticles on the surface of SiO2. In this study, conditions of DPN for organic patterns, AEAPTMS, with sub-100 nm dimensions are investigated. Moreover, gold nanoparticles with citrate-negativey-charged surface were deposited selectively on top of DPN orgainc patterns. Lateral force microscope (LFM) was utilized to differentiate different surface between oxidized semi-conductor surfaces and patterned areas with monolayer of AEAPTMS. Line-width as small as 60 nm has been successfully achieved by this method.",

keywords = "AFM tip, Dip-pen nanolithography (DPN), Lateral force microscopy (LFM), N-(2-aminoethyl)-3-amino propyl-tri-meth-oxysilane (AEAPT-MS)",

author = "Jeng-Tzong Sheu and Wu, {C. H.} and Liu, {H. H.} and Tien-Sheng Chao",

year = "2005",

month = dec,

day = "1",

doi = "10.1109/NANO.2005.1500862",

language = "English",

isbn = "0780391993",

series = "2005 5th IEEE Conference on Nanotechnology",

pages = "895--898",

booktitle = "2005 5th IEEE Conference on Nanotechnology",

note = "2005 5th IEEE Conference on Nanotechnology ; Conference date: 11-07-2005 Through 15-07-2005",

}

Sheu, J-T, Wu, CH, Liu, HH & Chao, T-S 2005, Preparation of nano-scale patterns on the silicon oxide surface by dip-pen nanolithography. 於 2005 5th IEEE Conference on Nanotechnology., 1500862, 2005 5th IEEE Conference on Nanotechnology, 卷 2, 頁 895-898, 2005 5th IEEE Conference on Nanotechnology, Nagoya, 日本, 11/07/05. https://doi.org/10.1109/NANO.2005.1500862

TY - GEN

T1 - Preparation of nano-scale patterns on the silicon oxide surface by dip-pen nanolithography

AU - Sheu, Jeng-Tzong

AU - Wu, C. H.

AU - Liu, H. H.

AU - Chao, Tien-Sheng

PY - 2005/12/1

Y1 - 2005/12/1

N2 - Dip-pen nanolithography (DPN), which uses an "inked" AFM tip to deposit organic molecules through a water meniscus onto an underlying substrate under ambient conditions, has been used to create N-(2-aminoethyl)-3-amino- propyl-trimethoxysilane (AEAPTMS) nano patterns as linkers for anchoring gold nanoparticles on the surface of SiO2. In this study, conditions of DPN for organic patterns, AEAPTMS, with sub-100 nm dimensions are investigated. Moreover, gold nanoparticles with citrate-negativey-charged surface were deposited selectively on top of DPN orgainc patterns. Lateral force microscope (LFM) was utilized to differentiate different surface between oxidized semi-conductor surfaces and patterned areas with monolayer of AEAPTMS. Line-width as small as 60 nm has been successfully achieved by this method.

AB - Dip-pen nanolithography (DPN), which uses an "inked" AFM tip to deposit organic molecules through a water meniscus onto an underlying substrate under ambient conditions, has been used to create N-(2-aminoethyl)-3-amino- propyl-trimethoxysilane (AEAPTMS) nano patterns as linkers for anchoring gold nanoparticles on the surface of SiO2. In this study, conditions of DPN for organic patterns, AEAPTMS, with sub-100 nm dimensions are investigated. Moreover, gold nanoparticles with citrate-negativey-charged surface were deposited selectively on top of DPN orgainc patterns. Lateral force microscope (LFM) was utilized to differentiate different surface between oxidized semi-conductor surfaces and patterned areas with monolayer of AEAPTMS. Line-width as small as 60 nm has been successfully achieved by this method.

KW - AFM tip

KW - Dip-pen nanolithography (DPN)

KW - Lateral force microscopy (LFM)

KW - N-(2-aminoethyl)-3-amino propyl-tri-meth-oxysilane (AEAPT-MS)

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DO - 10.1109/NANO.2005.1500862

M3 - Conference contribution

AN - SCOPUS:33746911181

SN - 0780391993

SN - 9780780391994

T3 - 2005 5th IEEE Conference on Nanotechnology

SP - 895

EP - 898

BT - 2005 5th IEEE Conference on Nanotechnology

T2 - 2005 5th IEEE Conference on Nanotechnology

Y2 - 11 July 2005 through 15 July 2005

ER -

Preparation of nano-scale patterns on the silicon oxide surface by dip-pen nanolithography

摘要

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