Polybenzoxazine as a mold-release agent for nanoimprint lithography

Chih Feng Wang; Shih Feng Chiou; Fu-Hsiang Ko; Jem Kun Chen; Cheng Tung Chou; Chih Feng Huang; Shiao Wei Kuo; Feng Chih Chang

doi:10.1021/la062921e

Polybenzoxazine as a mold-release agent for nanoimprint lithography

Chih Feng Wang
, Shih Feng Chiou
, Fu-Hsiang Ko
, Jem Kun Chen
, Cheng Tung Chou
, Chih Feng Huang
, Shiao Wei Kuo
, Feng Chih Chang^*

^*此作品的通信作者

奈米科技碩博班

研究成果: Article › 同行評審

73 引文斯高帕斯（Scopus）

摘要

One of the most important tasks remaining to be resolved in nanoimprint lithography is the elimination of the resist sticking to the mold during demolding. Previously, the main approach was to apply a thin layer of fluorinated alkyl silane mold-release agent on the surface on the mold; however, this involves complicated steps and high costs. The low surface free energy material polybenzoxazine provides an efficient mold-release agent for silicon molds that is easier to process, costs less, and has no side reactions.

原文	English
頁（從 - 到）	5868-5871
頁數	4
期刊	Langmuir
卷	23
發行號	11
DOIs	https://doi.org/10.1021/la062921e
出版狀態	Published - 22 5月 2007

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10.1021/la062921e

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AU - Chiou, Shih Feng

AU - Ko, Fu-Hsiang

AU - Chen, Jem Kun

AU - Chou, Cheng Tung

AU - Huang, Chih Feng

AU - Kuo, Shiao Wei

AU - Chang, Feng Chih

PY - 2007/5/22

Y1 - 2007/5/22

N2 - One of the most important tasks remaining to be resolved in nanoimprint lithography is the elimination of the resist sticking to the mold during demolding. Previously, the main approach was to apply a thin layer of fluorinated alkyl silane mold-release agent on the surface on the mold; however, this involves complicated steps and high costs. The low surface free energy material polybenzoxazine provides an efficient mold-release agent for silicon molds that is easier to process, costs less, and has no side reactions.

AB - One of the most important tasks remaining to be resolved in nanoimprint lithography is the elimination of the resist sticking to the mold during demolding. Previously, the main approach was to apply a thin layer of fluorinated alkyl silane mold-release agent on the surface on the mold; however, this involves complicated steps and high costs. The low surface free energy material polybenzoxazine provides an efficient mold-release agent for silicon molds that is easier to process, costs less, and has no side reactions.

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JO - Langmuir

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IS - 11

ER -

Polybenzoxazine as a mold-release agent for nanoimprint lithography

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