Polarized-photoreflectance characterization of an InGaP/InGaAsN/GaAs NpN double-heterojunction bipolar transistor structure

C. J. Lin*, Y. S. Huang, N. Y. Li, Pei-Wen Li, K. K. Tiong

*此作品的通信作者

研究成果: Article同行評審

7 引文 斯高帕斯(Scopus)

摘要

We have characterized an InGaP/InGaAsN/GaAs NpN double-heterojunction bipolar transistor structure using polarized photoreflectance (PR)_spectroscopy. The ordering parameter of the InGaP is deduced from the polarization {[110] and [110]} dependence of the PR signals from the emitter region. The ordering related piezoelectric field is also found to influence the electric field, as evaluated from observed Franz-Keldysh oscillations, in the InGaP emitter region. The field in the emitter region is found to be about 25 kV/cm smaller than the theoretical value that does not take into account the possible ordering induced screening effect, while the field in the collector region agrees well with the theoretical value. In addition, the InGaAsN band gap is also determined by analyzing the PR spectrum of the base region.

原文English
頁(從 - 到)4565-4569
頁數5
期刊Journal of Applied Physics
90
發行號9
DOIs
出版狀態Published - 1 11月 2001

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