Polarized optical scattering measurements of nanoparticles upon a thin film silicon wafer

Cheng Yang Liu*, Tze An Liu, Wei En Fu

*此作品的通信作者

研究成果: Conference contribution同行評審

2 引文 斯高帕斯(Scopus)

摘要

The diameter and distribution measurements of nanoparticles on wafers are critical parameters in the semiconductor industry to ensure the quality of the transistors and increase the production rate. A goniometric optical scatter instrument has been developed at CMS / ITRI to readily perform polarized light scattering measurements for the diameter and distribution measurements of nanoparticles on wafers. The designed scatter instrument is capable of distinguishing various types of optical scattering characteristics, which are corresponding to the diameters of the nanoparticles, near surfaces by using the Mueller matrix calculation. The measurement range of nanoparticle diameters is 50 nm to 350 nm on 4 inches to 8 inches thin film wafers. These results demonstrate that the polarization of light scattered by particles can be used to determine the size of particulate contaminants on silicon wafers.

原文English
主出版物標題2008 8th IEEE Conference on Nanotechnology, IEEE-NANO
頁面116-119
頁數4
DOIs
出版狀態Published - 2008
事件2008 8th IEEE Conference on Nanotechnology, IEEE-NANO - Arlington, TX, United States
持續時間: 18 8月 200821 8月 2008

出版系列

名字2008 8th IEEE Conference on Nanotechnology, IEEE-NANO

Conference

Conference2008 8th IEEE Conference on Nanotechnology, IEEE-NANO
國家/地區United States
城市Arlington, TX
期間18/08/0821/08/08

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