Polarized optical scattering measurements of metallic nanoparticles upon a silicon wafer

Cheng Yang Liu*, Wei En Fu

*此作品的通信作者

研究成果: Conference contribution同行評審

摘要

Bidirectional ellipsometry has been developed as a technique for distinguishing among various scattering features near surfaces. The out-of-plane polarized light-scattering by metallic nanoparticles on wafer is calculated and measured. These calculations and measurements yield angular dependence of bidirectional ellipsometric parameters for out-ofplane scattering. The experimental data show good agreement with theoretical predictions for different diameter of gold spheres. The results suggest that improvements for accuracy are possible to perform measurements of scattering features from metallic nanoparticles. The polarization of light scattered by metallic nanoparticles can be used to determine the size of nano-particulate contaminants on silicon wafers.

原文English
主出版物標題Optical Measurement Systems for Industrial Inspection VI
DOIs
出版狀態Published - 2009
事件Optical Measurement Systems for Industrial Inspection VI - Munich, Germany
持續時間: 15 6月 200918 6月 2009

出版系列

名字Proceedings of SPIE - The International Society for Optical Engineering
7389
ISSN(列印)0277-786X

Conference

ConferenceOptical Measurement Systems for Industrial Inspection VI
國家/地區Germany
城市Munich
期間15/06/0918/06/09

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