Polarized optical scattering measurements of metallic nanoparticles on a thin film silicon wafer

Cheng Yang Liu*, Tze An Liu, Wei En Fu

*此作品的通信作者

研究成果: Conference contribution同行評審

摘要

Light scattering has shown its powerful diagnostic capability to characterize optical quality surfaces. In this study, the theory of bidirectional reflectance distribution function (BRDF) was used to analyze the metallic nanoparticles' sizes on wafer surfaces. The BRDF of a surface is defined as the angular distribution of radiance scattered by the surface normalized by the irradiance incident on the surface. A goniometric optical scatter instrument has been developed to perform the BRDF measurements on polarized light scattering on wafer surfaces for the diameter and distribution measurements of metallic nanoparticles. The designed optical scatter instrument is capable of distinguishing various types of optical scattering characteristics, which are corresponding to the diameters of the metallic nanoparticles, near surfaces by using the Mueller matrix calculation. The metallic nanoparticle diameter of measurement is 60 nm on 2 inch thin film wafers. These measurement results demonstrate that the polarization of light scattered by metallic particles can be used to determine the size of metallic nanoparticles on silicon wafers.

原文English
主出版物標題Frontiers of Characterization and Metrology for Nanoelectronics - 2009 International Conference on Frontiers of Characterization and Metrology for Nanoelectronics
頁面203-206
頁數4
DOIs
出版狀態Published - 2009
事件2009 International Conference on Frontiers of Characterization and Metrology for Nanoelectronics - Albany, NY, United States
持續時間: 11 5月 200915 5月 2009

出版系列

名字AIP Conference Proceedings
1173
ISSN(列印)0094-243X
ISSN(電子)1551-7616

Conference

Conference2009 International Conference on Frontiers of Characterization and Metrology for Nanoelectronics
國家/地區United States
城市Albany, NY
期間11/05/0915/05/09

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