Polarized angular dependence of three-dimensional light-scattering for nanoparticles on thin film wafer

Bidirectional ellipsometry has been developed as a technique for distinguishing among various scattering features near surfaces. The polarized angular dependence of three-dimensional light-scattering by the nanoparticles on thin film wafer is calculated and measured. These calculations and measurements yield angular dependence of bidirectional ellipsometric parameters for out-of-plane light-scattering. The experimental data show good agreement with theoretical predictions for different nanoparticle diameters and thin film thicknesses when bidirectional ellipsometry was employed to measure nanoparticles (60 nm, 100 nm, and 200 nm) on Si wafers with different film thicknesses of 2 nm, 5 nm, and 10 nm. Not only are the diameters of the nanoparticles determined, but also the film thicknesses can be calculated and distinguished from the measurement results. Additionally, the results indicate that improved accuracy is possible for measurements of scattering features from nanoparticles and thin films.