Pilot UV-AOP Comparison of UV/Hydrogen Peroxide, UV/Free Chlorine, and UV/Monochloramine for the Removal of N-Nitrosodimethylamine (NDMA) and NDMA Precursors

Shannon L. Roback*, Kenneth P. Ishida, Yi Hsueh Chuang, Zhong Zhang, William A. Mitch, Megan H. Plumlee

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Neuroscience

Chemical Engineering