Photo-leakage-current characteristic of F incorporated hydrogenated amorphous silicon thin film transistor

M. C. Wang, T. C. Chang*, Po-Tsun Liu, S. W. Tsao, J. R. Chen

*此作品的通信作者

研究成果: Article同行評審

9 引文 斯高帕斯(Scopus)

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Keyphrases

Material Science

Earth and Planetary Sciences

Chemical Engineering