Phase separation in alloy-Si interaction

G. Ottaviani; King-Ning Tu; J. W. Mayer; B. Y. Tsaur

doi:10.1063/1.91482

Phase separation in alloy-Si interaction

G. Ottaviani^*, King-Ning Tu, J. W. Mayer, B. Y. Tsaur

^*此作品的通信作者

國際半導體產業學院

研究成果: Article › 同行評審

45 引文斯高帕斯（Scopus）

摘要

Phase separation has been found to be a general phenomenon among many alloy-Si interactions at temperatures as high as 800°C. We have studied these interactions with alloys consisting of a near-noble metal of Ni, Pd, and Pt, and a refractory metal of Cr, V, and W. The interaction produces a silicide of the near-noble metals next to the Si and an outer layer of silicide of the refractory metals. No evidence for ternary formation has been found.

原文	English
頁（從 - 到）	331-333
頁數	3
期刊	Applied Physics Letters
卷	36
發行號	4
DOIs	https://doi.org/10.1063/1.91482
出版狀態	Published - 1 12月 1980

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Phase separation in alloy-Si interaction

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