Performance and reliability of non-linear Al-Zn-Sn-O based resistive random access memory

Yang Shun Fan, Wei Liang Chan, Chih Hsiang Chang, Guang Ting Zheng, Che Chia Chang, Po-Tsun Liu*

*此作品的通信作者

研究成果: Conference contribution同行評審

3 引文 斯高帕斯(Scopus)

摘要

The Al-doped zinc tin oxide based RRAM with non-linearity characteristic was demonstrated. The inhabit ratio (I.R.) of 34 was achieved by inserting ∼2nm Al2O3 tunnel barrier to ensure the possible incorporation of RRAM cell into high density cross-type array structure. Furthermore, the reliability with endurance and retention are also examined.

原文English
主出版物標題Proceedings of the 22nd International Symposium on the Physical and Failure Analysis of Integrated Circuits, IPFA 2015
發行者Institute of Electrical and Electronics Engineers Inc.
頁面381-384
頁數4
ISBN(電子)9781479999286
DOIs
出版狀態Published - 6月 2015
事件22nd International Symposium on the Physical and Failure Analysis of Integrated Circuits, IPFA 2015 - Hsinchu, 台灣
持續時間: 29 6月 20152 7月 2015

出版系列

名字Proceedings of the International Symposium on the Physical and Failure Analysis of Integrated Circuits, IPFA
2015-August

Conference

Conference22nd International Symposium on the Physical and Failure Analysis of Integrated Circuits, IPFA 2015
國家/地區台灣
城市Hsinchu
期間29/06/152/07/15

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