@inproceedings{ee7c04f4acb64f768c9916ea5ba5d659,
title = "Patterning of self-assembled nanoparticles by electron-beam lithography with chemically amplified resists",
abstract = "In this paper, patterning of self-assembled nanoparticles by using a shaped electron-beam exposure system with commercial chemically amplified resists (CAR) was demonstrated.",
author = "Kuo, {C. I.} and Chen, {H. L.} and Ying-hao Chu and Liu, {F. K.} and Fu-Hsiang Ko and Chu, {T. C.}",
note = "Publisher Copyright: {\textcopyright} 2003 Japan Soc. of Applied.; International Microprocesses and Nanotechnology Conference, MNC 2003 ; Conference date: 29-10-2003 Through 31-10-2003",
year = "2003",
doi = "10.1109/IMNC.2003.1268724",
language = "English",
series = "Digest of Papers - Microprocesses and Nanotechnology 2003 - 2003 International Microprocesses and Nanotechnology Conference, MNC 2003",
publisher = "Institute of Electrical and Electronics Engineers Inc.",
pages = "224--225",
booktitle = "Digest of Papers - Microprocesses and Nanotechnology 2003 - 2003 International Microprocesses and Nanotechnology Conference, MNC 2003",
address = "United States",
}