Pattern Profile Distortion and Stress Evolution in Nanoporous Qrganosilicates after Photoresist Stripping

Po-Tsun Liu*, C. W. Chen, T. C. Chang, Tseung-Yuen Tseng

*此作品的通信作者

研究成果: Article › 同行評審

指紋

深入研究「Pattern Profile Distortion and Stress Evolution in Nanoporous Qrganosilicates after Photoresist Stripping」主題。共同形成了獨特的指紋。

Physics & Astronomy

Engineering & Materials Science

Chemical Compounds