Particle contaminations in LPCVD polysilicon

Keyphrases

• Low Pressure Chemical Vapor Deposition (LPCVD) 100%
• Polysilicon 100%
• Particle Contamination 100%
• Poly-Si Film 50%
• Gas Temperature 50%
• Surface Defects 50%
• Gas Flow Rate 50%
• Injector 50%
• Orthogonal Array 50%
• Particle Formation 50%
• Injection Temperature 50%
• Injection Flow Rate 50%
• Gas Injection 50%
• Multiple Holes 50%
• Gas Injection Rate 50%

Engineering

• Polysilicon 100%
• Deposited Film 50%
• Key Parameter 50%
• Gas Flowrate 50%
• Gas Injection Rate 50%
• Gas Injection 50%
• Surface Defect 50%

Chemical Engineering

• Polysilicon 100%
• Low Pressure Chemical Vapor Deposition 100%
• Film 50%