Over 10W/mm High Power Density AlGaN/GaN HEMTs With Small Gate Length by the Stepper Lithography for Ka-Band Applications
Ming Wen Lee, Yueh Chin Lin, Po Sheng Chang, Yi Fan Tsao, Heng Tung Hsu, Chang Fu Dee, Edward Yi Chang*
*此作品的通信作者
研究成果: Article › 同行評審
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斯高帕斯(Scopus)