Over 10W/mm High Power Density AlGaN/GaN HEMTs With Small Gate Length by the Stepper Lithography for Ka-Band Applications

Ming Wen Lee, Yueh Chin Lin, Po Sheng Chang, Yi Fan Tsao, Heng Tung Hsu, Chang Fu Dee, Edward Yi Chang*

*此作品的通信作者

研究成果: Article同行評審

3 引文 斯高帕斯(Scopus)

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Keyphrases

Engineering