Organic thin-film transistors with AIN film as a gate-insulator by RFIICP sputtering

Kuo Hsi Yen*, Hsiao-Wen Zan, Chueh Ping Ko, Pu Kuan Liu, Tzu Yueh Chang, Kuo Hai Su, Chiung Sheng Wei, Po-Tsung Lee, Chien Hsun Chen, Chun Ming Yeh, Jennchang Hwang

*此作品的通信作者

研究成果: Paper同行評審

1 引文 斯高帕斯(Scopus)

摘要

We firstly fabricated the organic thin-film transistors with sputtered-AIN film as the gate insulator. The AlN film was deposited by the RF-ICP (Induced Couple Plasma) sputtering. The demonstrated pentacene based TFTs had on/off current ratio around 4 and mobility around 5×10-4 cm 2/Vs without any surface treatment and pentacene purification. All optimized conditions for this new proposed device were under processing.

原文English
頁面56-58
頁數3
出版狀態Published - 10月 2005
事件Second Americas Display Engineering and Applications Conference, ADEAC 2005 - Portland, OR, 美國
持續時間: 25 10月 200527 10月 2005

Conference

ConferenceSecond Americas Display Engineering and Applications Conference, ADEAC 2005
國家/地區美國
城市Portland, OR
期間25/10/0527/10/05

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