Optoelectronic and structural properties of good quality hydrogenated amorphous silicon carbide films deposited by hot wire assisted RF plasma deposition technique
S. Chattopadhyay*, Debabrata Das, A. K. Barua, D. L. Williamson, S. T. Kshirsagar
深入研究「Optoelectronic and structural properties of good quality hydrogenated amorphous silicon carbide films deposited by hot wire assisted RF plasma deposition technique」主題。共同形成了獨特的指紋。