Optimization of the Deposition Condition for Improving the Ti Film Resistance of DRAM Products

Yun-Wei Lin*, Chia Ming Lin

*此作品的通信作者

研究成果: Conference contribution › 同行評審

指紋

深入研究「Optimization of the Deposition Condition for Improving the Ti Film Resistance of DRAM Products」主題。共同形成了獨特的指紋。

Keyphrases

Engineering