@inproceedings{a2741ee7f6e04232821e0ff4019bb5fd,
title = "Optical-gradient type of antireflective coatings for sub-70 nm optical lithography applications",
abstract = "We demonstrate an optical-gradient bottom antireflective coating film, which is prepared by a silicon nitride film treated with oxygen plasma. Results indicate that the optical-gradient type film is suitable for sub-70 nm optical lithography applications.",
author = "Chen, {H. L.} and Wonder Fan and Wang, {T. J.} and Fu-Hsiang Ko and Zhai, {R. S.} and Hsu, {C. K.} and Chuang, {T. J.}",
year = "2003",
month = jan,
day = "1",
doi = "10.1109/CLEOPR.2003.1277241",
language = "English",
series = "Pacific Rim Conference on Lasers and Electro-Optics, CLEO - Technical Digest",
publisher = "Institute of Electrical and Electronics Engineers Inc.",
booktitle = "CLEO/Pacific Rim 2003 - 5th Pacific Rim Conference on Lasers and Electro-Optics",
address = "United States",
note = "5th Pacific Rim Conference on Lasers and Electro-Optics, CLEO/Pacific Rim 2003 ; Conference date: 15-12-2003 Through 19-12-2003",
}