Optical cross-talk reduction in a quantum-dot-based full-color micro-light-emitting-diode display by a lithographic-fabricated photoresist mold

Huang Yu Lin, Chin Wei Sher, Dan Hua Hsieh, Xin Yin Chen, Huang-Ming Chen, Teng-Ming Chen, Kei May Lau, Chyong-Hua Chen, Chien-Chung Lin, Hao-Chung Kuo*

*此作品的通信作者

研究成果: Article同行評審

152 引文 斯高帕斯(Scopus)

摘要

In this study, a full-color emission red-green-blue (RGB) quantum-dot (QD)-based micro-light-emitting-diode (micro-LED) array with the reduced optical cross-talk effect by a photoresist mold has been demonstrated. The UV micro-LED array is used as an efficient excitation source for the QDs. The aerosol jet technique provides a narrow linewidth on the micrometer scale for a precise jet ofQDson the micro-LEDs. To reduce the optical cross-talk effect, a simple lithography method and photoresist are used to fabricate the mold, which consists of a window for QD jetting and a blocking wall for cross-talk reduction. The cross-talk effect of the well-confined QDs in the window is confirmed by a fluorescence microscope, which shows clear separation between QD pixels. A distributed Bragg reflector is covered on the micro-LED array and the QDs’ jetted mold to further increase the reuse of UV light. The enhanced light emission of the QDs is 5%, 32%, and 23% for blue, green, and red QDs, respectively.

原文English
頁(從 - 到)411-416
頁數6
期刊Photonics Research
5
發行號5
DOIs
出版狀態Published - 1 10月 2017

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