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Optical and electronic characteristics of germanium quantum dots formed by selective oxidation of SiGe/Si-on-insulator
Pei-Wen Li
*
, David M.T. Kuo, Wei Ming Liao, Ming J. Tsai
*
此作品的通信作者
電子研究所
研究成果
:
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同行評審
18
引文 斯高帕斯(Scopus)
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Keyphrases
SiGe
100%
Insulator
100%
Optical Characteristics
100%
Spectroscopic Ellipsometry
100%
Germanium Quantum Dots
100%
Selective Oxidation
100%
Electronic Characteristics
100%
Dot Size
66%
Ge Dot
66%
High-resolution Transmission Electron Microscopy (HRTEM)
33%
Crystalline Structure
33%
Blue Shift
33%
Size Effect
33%
Room Temperature
33%
Refractive Index
33%
Thermal Oxidation
33%
Shape Structure
33%
Peak Energy
33%
Oxidation Time
33%
Photoemission
33%
SiO2 Matrix
33%
SiGe-on-insulator
33%
Nanocrystal Size
33%
Cathodoluminescence Spectroscopy
33%
Structure Transition
33%
Crystal Morphology
33%
Oxidation Condition
33%
Material Science
Quantum Dot
100%
Oxidation Reaction
100%
Germanium
100%
Selective Oxidation
100%
Refractive Index
50%
High-Resolution Transmission Electron Microscopy
50%
Cathodoluminescence Spectroscopy
50%
Crystal Structure
50%
Crystallite
50%