Optical and electronic characteristics of germanium quantum dots formed by selective oxidation of SiGe/Si-on-insulator

Pei-Wen Li*, David M.T. Kuo, Wei Ming Liao, Ming J. Tsai

*此作品的通信作者

研究成果: Article同行評審

18 引文 斯高帕斯(Scopus)

摘要

Germanium quantum dots embedded in a SiO2 matrix fabricated by selective oxidation of SiGe-on-insulator structure were examined by high-resolution transmission electron microscopy, cathodoluminescence spectroscopy, and spectroscopic ellipsometry. The dot size and crystallite morphology were strongly dependent on thermal oxidation conditions. Visible photoemissions from Ge dots were observed at room temperature and they exhibited pronounced blueshifts of peak energies with increasing oxidation time, which can be correlated to the change in dot size, shape, or crystalline structure transition. The extracted refractive index of Ge dots examined by spectroscopic ellipsometry is lower than that of bulk Ge, which is also correlated to the nanocrystal size effects.

原文English
頁(從 - 到)7788-7792
頁數5
期刊Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers
43
發行號11 A
DOIs
出版狀態Published - 11月 2004

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