Numerical analysis of oxygen-related defects in amorphous in-w-o nanosheet thin-film transistor

Wan Ta Fan, Po Tsun Liu*, Po Yi Kuo, Chien Min Chang, I. Han Liu, Yue Kuo

*此作品的通信作者

研究成果: Article同行評審

3 引文 斯高帕斯(Scopus)

摘要

The integration of 4 nm thick amorphous indium tungsten oxide (a-IWO) and a hafnium oxide (HfO2 ) high-κ gate dielectric has been demonstrated previously as one of promising amorphous oxide semiconductor (AOS) thin-film transistors (TFTs). In this study, the more positive threshold voltage shift (∆VTH ) and reduced ION were observed when increasing the oxygen ratio during a-IWO deposition. Through simple material measurements and Technology Computer Aided Design (TCAD) analysis, the distinct correlation between different chemical species and the corresponding bulk and interface density of states (DOS) parameters were systematically deduced, validating the proposed physical mechanisms with a quantum model for a-IWO nanosheet TFT. The effects of oxygen flow on oxygen interstitial (Oi ) defects were numerically proved for modulating bulk dopant concentration Nd and interface density of Gaussian acceptor trap NGA at the front channel, significantly dominating the transfer characteristics of a-IWO TFT. Furthermore, based on the studies of density functional theory (DFT) for the correlation between formation energy Ef of Oi defect and Fermi level (EF ) position, we propose a numerical methodology for monitoring the possible concentration distribution of Oi as a function of a bias condition for AOS TFTs.

原文English
文章編號3070
期刊Nanomaterials
11
發行號11
DOIs
出版狀態Published - 11月 2021

指紋

深入研究「Numerical analysis of oxygen-related defects in amorphous in-w-o nanosheet thin-film transistor」主題。共同形成了獨特的指紋。

引用此