Novel precleaning treatment for selective tungsten chemical vapor deposition

T. C. Chang*, Y. S. Mor, Po-Tsun Liu, S. M. Sze, Y. L. Yang, M. S. Tsai, C. Y. Chang

*此作品的通信作者

研究成果: Conference article同行評審

1 引文 斯高帕斯(Scopus)

摘要

The new solutions, hydroxylamine sulfate [(NH2OH)2H2SO4] combined with CuSO4, for cleaning Al via were investigated. It is found that the cleaning capability of hydroxylamine sulfate combined with CuSO4 is better than that of hydroxylamine sulfate. Low via resistance of electrical test structure is obtained if the via is cleaned by this new cleaning solution. The hydroxylamine sulfate can efficiently remove Al3O2 and leave the clean Al on the surface of via. Then, the Cu ion in this new solution will immediately react with clean Al and form a copper passivating layer on the surface of via. The copper is more stable than aluminum in the environment and hard to be oxidized. Therefore, hydroxylamine sulfate combined with CuSO4 can provide excellent cleaning capability for aluminum via holes. Also, the clean surface on the bottom of via is helpful for tungsten nucleation in via during CVD-W deposition. Therefore, a low via resistance and good selectivity of tungsten plug are obtained when the Al via is precleaned with this new solution.

原文English
頁(從 - 到)451-455
頁數5
期刊Thin Solid Films
355
DOIs
出版狀態Published - 1 11月 1999
事件Proceedings of the 1999 26th International Conference on Metallurgic Coatings and Thin Films - San Diego, CA, USA
持續時間: 12 4月 199915 4月 1999

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