Novel electrostatic discharge protection design for nanoelectronics in nanoscale CMOS technology

Ming-Dou Ker, Tang Kui Tseng

    研究成果: Conference contribution同行評審

    1 引文 斯高帕斯(Scopus)

    摘要

    A novel electrostatic discharge (ESD) protection concept by using the already-on device is proposed to effectively protect CMOS integrated circuits (IC) in nanoscale CMOS processes against ESD stress. Such an already-on NMOS device is designed to have a threshold voltage of ∼0V, or even negative. When the IC is under the ESD zapping conditions, such already-on NMOS in CMOS IC are initially standing in the turn-on state and ready to discharge ESD current during any ESD zapping. So, such already-on NMOS has the fastest turn-on speed and the lowest trigger-on voltage to effectively protect the internal circuits with a much thinner gate oxide (∼15Å) in future sub-100 nm CMOS technology. To keep such already-on devices off when the IC is under normal circuit operating condition, an on-chip negative voltage generator realized by the diodes and capacitors is used to bias the gates of such already-on devices. The proposed already-on device and the on-chip negative voltage generator are fully process-compatible to the general sub-100 nm CMOS processes.

    原文English
    主出版物標題2003 3rd IEEE Conference on Nanotechnology, IEEE-NANO 2003 - Proceedings
    發行者IEEE Computer Society
    頁面737-740
    頁數4
    ISBN(電子)0780379764
    DOIs
    出版狀態Published - 1 1月 2003
    事件2003 3rd IEEE Conference on Nanotechnology, IEEE-NANO 2003 - San Francisco, United States
    持續時間: 12 8月 200314 8月 2003

    出版系列

    名字Proceedings of the IEEE Conference on Nanotechnology
    2
    ISSN(列印)1944-9399
    ISSN(電子)1944-9380

    Conference

    Conference2003 3rd IEEE Conference on Nanotechnology, IEEE-NANO 2003
    國家/地區United States
    城市San Francisco
    期間12/08/0314/08/03

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