Novel Deep-blue Light Phase-only LCoS 1080p Panel for Maskless Holographic Etching Optical System

Wei Tien Chang, Jhou Pu Yang, Zheng Ning Xu, Huang Ming Philip Chen

研究成果: Conference article同行評審

1 引文 斯高帕斯(Scopus)

摘要

Arbitrary and reconfiguration pattern transfer photolithographic process using deep blue light source (405 nm) with off-axis phase-only beam shaping system is reported in this study. The LCoS panel uniformity error is below 1.41 % with 8 ms response time. Reconstructed diffraction images from CGH patterns were displayed on 8° off-axis screen/target plate. The linearly calibrated look-up table (LUT) showed better performance in suppressing the zero-order intensity. The ghost image was solved as well. The diffractive images generated from linear LUT can be applied in the maskless lithographic pattern. The periodic stripe pattern at 35 pm width with 2 pm thickness photoresistant film was demonstrated using the reported optical system.

原文English
頁(從 - 到)1873-1875
頁數3
期刊Digest of Technical Papers - SID International Symposium
48
發行號1
DOIs
出版狀態Published - 2017
事件SID Symposium, Seminar, and Exhibition 2017, Display Week 2017 - Los Angeles, United States
持續時間: 21 5月 201726 5月 2017

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