Nitrogen-related enhanced reliability degradation in nMOSFETs with 1.6 nm gate dielectric

Ching Wei Chen, Chao-Hsin Chien, Shih Chich Ou, Tsu Hsiu Perng, Da Yuan Lee, Yi Cheng Chen, Horng-Chih Lin, Tiao Yuan Huang, Chun Yen Chang

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Engineering

Material Science