摘要
Indium tin oxide (ITO) (2300nm) and Ni (5nm)/Au (10nm) films were deposited onto glass substrates, p-GaN layers, n+-InGaN/GaN short-period-superlattice (SPS) structures and near-ultraviolet (near-UV) In0.05Ga0.95N/Al0.1Ga0.9N light emitting diodes (LEDs). It was found that ITO on n+-SPS structure could provide us an extremely high transparency (i.e. 86.5% at 400nm) and a reasonably small 1.2×10-3Ωcm2 specific contact resistance. It was also found that, at 20mA, the forward voltage of the near-UV LED with ITO on n+-SPS upper contact was 3.13V, which is exactly the same as that of the near-UV LED with Ni/Au on n+-SPS upper contact. Furthermore, it was found that we could achieve a 36% larger output power by using such an ITO on n+-SPS upper contact.
原文 | English |
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頁(從 - 到) | 69-72 |
頁數 | 4 |
期刊 | Materials Science and Engineering B: Solid-State Materials for Advanced Technology |
卷 | 106 |
發行號 | 1 |
DOIs | |
出版狀態 | Published - 15 1月 2004 |