Nitride-based light-emitting diodes with p-AlInGaN surface layers prepared at various temperatures

C. W. Kuo*, C. M. Chen, Cheng-Huang Kuo, G. C. Chi

*此作品的通信作者

研究成果: Conference contribution同行評審

摘要

We have prepared bulk p-AlInGaN layers and light emitting diodes (LEDs) with p-AlInGaN surface layers by metalorganic chemical vapor deposition (MOCVD). It was found that surfaces of the LEDs with p-AlInGaN layers were rough with high density of hexagonal pits. It was also found that pit width and pit density depend on the growth temperature of the p-AlInGaN layer. Furthermore, it was found that we can achieve 62% enhancement in output intensity from the LED with 820°C p-AlInGaN cap layer without increasing the LED operation voltage.

原文English
主出版物標題Gallium Nitride Materials and Devices II
DOIs
出版狀態Published - 24 5月 2007
事件Gallium Nitride Materials and Devices II - San Jose, CA, United States
持續時間: 22 1月 200725 1月 2007

出版系列

名字Proceedings of SPIE - The International Society for Optical Engineering
6473
ISSN(列印)0277-786X

Conference

ConferenceGallium Nitride Materials and Devices II
國家/地區United States
城市San Jose, CA
期間22/01/0725/01/07

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