摘要
GaN epitaxial layers and nitride-based light-emitting diodes (LEDs) structures with a conventional single low-temperature (LT) GaN buffer layer and multiple MgxNy/GaN buffer layers were prepared by metalorganic chemical vapor deposition. It was found that crystal quality of the GaN epilayer prepared on multiple MgxNy/GaN buffer layers was significantly better than that prepared with conventional low-temperature GaN nucleation layer. With the multiple MgxNy/GaN buffer layers, it was also found that 20 mA LED output power can be enhanced by 12%, as compared to the conventional LED. Such an enhancement in output power could be attributed to the reduction of threading dislocation induced nonradiative recombination centers using 12-pairs MgxNy/GaN buffer layers. Crown
原文 | English |
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頁(從 - 到) | 590-594 |
頁數 | 5 |
期刊 | Solid-State Electronics |
卷 | 54 |
發行號 | 5 |
DOIs | |
出版狀態 | Published - 1 5月 2010 |