NEW METHOD OF MEASURING DIFFUSION LENGTH AND SURFACE RECOMBINATION VELOCITY.

Y. S. Kim*, C. I. Drowley, Chen-Ming Hu

*此作品的通信作者

研究成果: Conference article同行評審

2 引文 斯高帕斯(Scopus)

摘要

In this method, chopped light that may be broadband and of unknown but constant intensity is incident from the bulk side of the test cell. The photocurrent, I is measured as a function of the effective bulk thickness of the cell, which is varied by varying the junction reverse bias. The diffusion length and the surface recombination velocity of the bulk material can be deduced from the data directly - without curve fitting. The effective surface recombination velocity at an oxidized silicon surface can be varied by applying a bias voltage to a transparent gate electrode. The recombination velocity can exhibit a maximum when the surface is depleted.

原文English
頁(從 - 到)596-600
頁數5
期刊Conference Record of the IEEE Photovoltaic Specialists Conference
出版狀態Published - 1 1月 1980
事件Conf Rec IEEE Photovoltaic Spec Conf 14th - San Diego, CA, USA
持續時間: 7 1月 198010 1月 1980

指紋

深入研究「NEW METHOD OF MEASURING DIFFUSION LENGTH AND SURFACE RECOMBINATION VELOCITY.」主題。共同形成了獨特的指紋。

引用此