New experimental evidences of the plasma charging enhanced hot carrier effect and its impact on surface channel CMOS devices

Keyphrases

• Charge Plasma 100%
• CMOS Devices 100%
• Surface Channel 100%
• Hot Carrier Effect 100%
• Edge Damage 100%
• Plasma Etching 33%
• Polysilicon 33%
• Spatial Distribution 33%
• Interface States 33%
• NMOSFET 33%
• PMOSFET 33%
• Charge Pump 33%
• Device Degradation 33%
• High Density 33%
• Plasma Process 33%
• 4-phase 33%
• Drain Regions 33%
• Phase Boundary 33%
• Damage Mechanism 33%
• Profiling Techniques 33%
• Two-peak 33%
• Scaled Device 33%
• Antenna Structure 33%
• Damage Effect 33%
• Plasma Edge 33%

Engineering

• Carrier Effect 100%
• Interface State 50%
• Metal-Oxide-Semiconductor Field-Effect Transistor 50%
• Antenna 50%
• Plasma Process 50%
• Drain Region 50%
• Damage Mechanism 50%
• Spatial Distribution 50%

Material Science

• Hot Carrier 100%
• Surface (Surface Science) 100%
• Density 50%
• Silicon 50%
• Metal-Oxide-Semiconductor Field-Effect Transistor 50%
• Plasma Etching 50%