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Nanosized-metal-grain-induced characteristic fluctuation in gate-all-around si nanowire metal-oxide-semiconductor devices
Chun Ning Lai
, Chien Yang Chen
,
Yi-ming Li
電信工程研究所
研究成果
:
Conference contribution
›
同行評審
2
引文 斯高帕斯(Scopus)
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Keyphrases
Silicon Nanowires (SiNWs)
100%
Gate-all-around
100%
Metal-oxide-semiconductor Devices
100%
Nanograins
100%
Characteristic Fluctuation
100%
Metal Grains
75%
Work Function
50%
Channel Width
50%
MOS Devices
25%
Grain Size
25%
Wave Function
25%
Poisson Equation
25%
Schrdinger
25%
Large Channel
25%
Quantum Confinement
25%
Square Shape
25%
Work Function Fluctuation
25%
Corner Effect
25%
Random Location
25%
Material Science
Nanowire
100%
Metal Oxide
100%
Oxide Semiconductor
100%
Semiconductor Device
100%
Grain Size
50%
Physics
Metal Oxide Semiconductor
100%
Semiconductor Device
100%
Nanowire
100%
Poisson Equation
50%
Particle Size
50%
Engineering
Si Nanowires
100%
Metal oxide semiconductor devices
100%
Quantum Confinement
50%
Grain Size
50%
Particle Size
50%