Nanometer-scale conversion of Si3N4 to SiOx

F. S.S. Chien, J. W. Chang, S. W. Lin, Y. C. Chou, T. T. Chen, S. Gwo*, Tien-Sheng Chao, W. F. Hsieh

*此作品的通信作者

研究成果: Article同行評審

84 引文 斯高帕斯(Scopus)

摘要

It has been found that atomic force microscope (AFM) induced local oxidation is an effective way for converting thin (<5 nm) Si3N4 films to SiOx. The threshold voltage for the 4.2 nm film is as low as 5 V and the initial growth rate is on the order of 103 nm/s at 10 V. Micro-Auger analysis of the selectively oxidized region revealed the formation of SiOx. Due to the large chemical selectivity in various etchants and great thermal oxidation rate difference between Si3N4, SiO2, and Si, AFM patterning of Si3N4 films can be a promising method for fabricating nanoscale structures.

原文English
頁(從 - 到)360-362
頁數3
期刊Applied Physics Letters
76
發行號3
DOIs
出版狀態Published - 17 1月 2000

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