N+ -doped-layer-free microcrystalline silicon thin film transistors fabricated with the CuMg as source/drain metal

M. C. Wang*, T. C. Chang, Po-Tsun Liu, R. W. Xiao, L. F. Lin, Y. Y. Li, F. S. Yeh, J. R. Chen

*此作品的通信作者

研究成果: Article › 同行評審

4 引文 斯高帕斯（Scopus）

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Keyphrases

Engineering

Material Science