@inproceedings{6f84b41c89ef44e88c1b3e07a84f3a1e,
title = "MULTIPHOTON IONIZATION MASS SPECTROMETRY AS A MECHANISTIC PROBE OF CHEMICAL VAPOR DEPOSITION.",
abstract = "The low pressure pyrolysis of alkylmetals on conducting, semiconducting and non-conducting surfaces was studied using multiphoton and electron ionization analysis. No products of surface radical recombination (such as CH//4 and C//2H//6) could be seen under the conditions employed. The activation energy for gas phase methyl radical production is 30 kcal/mol for trimethylgallium compared with 13 plus or minus 2 kcal/mol observed for trimethylaluminum decomposition. A deposition mechanism is proposed.",
author = "Squire, {D. W.} and Dulcey, {C. S.} and Ming-Chang Lin",
year = "1985",
month = dec,
day = "1",
doi = "10.2351/1.5059594",
language = "English",
isbn = "0912035293",
series = "LIA (Laser Institute of America)",
publisher = "Laser Inst of America",
pages = "148--151",
booktitle = "LIA (Laser Institute of America)",
}