MPI/MS detection of SiF and SiF2 radicals produced from the reaction of F2 and NF3 with silicon

J. A. Dagata*, D. W. Squire, C. S. Dulcey, D. S.Y. Hsu, Ming-Chang Lin

*此作品的通信作者

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21 引文 斯高帕斯(Scopus)

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Keyphrases

Chemistry

Chemical Engineering