Monolithically Integrated 650 nm and 780 nm semiconductor lasers with aluminum-free active areas

Tien Chang Lu^*, S. C. Wang, Richard Fu, H. M. Shieh, K. J. Huang

^*此作品的通信作者

研究成果: Paper › 同行評審

原文	English
出版狀態	Published - 2001
事件	Conference on Lasers and Electro-Optics, CLEO 2001 - Baltimore, 美國持續時間: 6 5月 2001 → 10 5月 2001

Conference	Conference on Lasers and Electro-Optics, CLEO 2001
國家/地區	美國
城市	Baltimore
期間	6/05/01 → 10/05/01

其它文件與鏈接

@conference{d41fe47684734bb4b823791037a904ba,

title = "Monolithically Integrated 650 nm and 780 nm semiconductor lasers with aluminum-free active areas",

author = "Lu, {Tien Chang} and Wang, {S. C.} and Richard Fu and Shieh, {H. M.} and Huang, {K. J.}",

year = "2001",

language = "English",

note = "Conference on Lasers and Electro-Optics, CLEO 2001 ; Conference date: 06-05-2001 Through 10-05-2001",

}

TY - CONF

T1 - Monolithically Integrated 650 nm and 780 nm semiconductor lasers with aluminum-free active areas

AU - Lu, Tien Chang

AU - Wang, S. C.

AU - Fu, Richard

AU - Shieh, H. M.

AU - Huang, K. J.

PY - 2001

Y1 - 2001

UR - http://www.scopus.com/inward/record.url?scp=85136221961&partnerID=8YFLogxK

M3 - Paper

AN - SCOPUS:85136221961

T2 - Conference on Lasers and Electro-Optics, CLEO 2001

Y2 - 6 May 2001 through 10 May 2001

ER -