Modified double EWMA approach for mixed product run-to-run CMP process control

An-Chen Lee*, Tzu Wei Kuo, Zeng Lien Lee

*此作品的通信作者

研究成果: Conference contribution同行評審

2 引文 斯高帕斯(Scopus)

摘要

Advanced process control (APC) has been recognized as a proper tool for maximizing profitability of semiconductor manufacturing facilities by improving efficiency and product quality. Run-to-run (RtR) process control with good quality and reliable performance for APC applications are most applicable. Chemical mechanical planarization (CMP) is part of critical processing module in semiconductor manufacturing. This paper proposes a new RtR control scheme, modified double EWMA controller (m-dEWMA), which is adaptive to the mixed product CMP processes. The m-dEWMA controller combined thread dEWMA with the drift compensation scheme to deal with the drift and shift disturbances caused by tool and products, respectively. Comparing recently mixed product control schemes: threaded EWMA controller, JADE control and threaded prediction correction controller (threaded PCC), the simulation results show that the m-dEWMA has better control performance than other controllers. The experiment results revealed that the m-dEWMA controller improves the wafer uniformity significantly in mixed product CMP process.

原文English
主出版物標題Advanced Manufacturing Technology
頁面2504-2511
頁數8
DOIs
出版狀態Published - 26 9月 2011
事件2011 International Conference on Advanced Design and Manufacturing Engineering, ADME 2011 - Guangzhou, China
持續時間: 16 9月 201118 9月 2011

出版系列

名字Advanced Materials Research
314-316
ISSN(列印)1022-6680

Conference

Conference2011 International Conference on Advanced Design and Manufacturing Engineering, ADME 2011
國家/地區China
城市Guangzhou
期間16/09/1118/09/11

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