摘要
A calculation of the channel-substrate space charge densities and dimensions is required in the formulation of device models for modern GaAs FETs which are fabricated on semi-insulating substrates with multiple deep levels. We describe a procedure to deduce this information from the compensation scheme utilized to obtain semi-insulating behavior.
原文 | English |
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頁(從 - 到) | 165-168 |
頁數 | 4 |
期刊 | Solid State Electronics |
卷 | 32 |
發行號 | 2 |
DOIs | |
出版狀態 | Published - 1 1月 1989 |