Modeling of pocket implanted MOSFETs for anomalous analog behavior

Kanyu Mark Cao*, Weidong Liu, Xiaodong Jin, Karthik Vasanth, Keith Green, John Krick, Tom Vrotsos, Chen-Ming Hu

*此作品的通信作者

研究成果: Conference article同行評審

74 引文 斯高帕斯(Scopus)

摘要

Pocket implant is widely used in deep-sub-micron CMOS technologies to combat short channel effects. It, however, brings anomalously large drain-induced threshold voltage shift and low output resistance to long channel devices. This creates a serious problem for high-performance analog circuits. In this paper, the first physical model of these effects are proposed and verified against data from a 0.18μm technology. This model is suitable for SPICE modeling.

原文English
頁(從 - 到)171-174
頁數4
期刊Technical Digest - International Electron Devices Meeting
DOIs
出版狀態Published - 1999
事件1999 IEEE International Devices Meeting (IEDM) - Washington, DC, USA
持續時間: 5 12月 19998 12月 1999

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