Modeling and Understanding of Rear Junction Double-Side Passivated Contact Solar Cells with Selective Area TOPCon on Front

Ying Yuan Huang, Aditi Jain, Wook Jin Choi, Keeya Madani, Young Woo Ok, Ajeet Rohatgi

研究成果: Conference contribution同行評審

9 引文 斯高帕斯(Scopus)

摘要

Device modeling is performed to propose > 25% efficient industry-compatible rear junction double-side passivated contacts solar cell structure with full area p-TOPCon on the rear and selective area n-TOPCon under the front grid pattern (selective TOPCon). This design enables the use of thicker TOPCon (>100nm) on the front for traditional screen-printed contacts without incurring metal-induced damage, high parasitic absorption loss, and compromise in lateral transport or carrier collection on the front. Rear junction design with appropriate bulk lifetime and resistivity combination eliminate the need for heavy doping in the front field region because carriers can flow through the bulk Si without appreciable FF loss. High VOC is maintained because high-quality Si surface passivation in the field region by Al2O3/SiN gives J0 comparable to the TOPCon. Our device modeling specifies the practically achievable properties and parameters for each region, including full area rear p-TOPCon, selective area front n-TOPCon, bulk and contacts, to achieve 25.4% efficiency screen-printed bifacial rear junction selective TOPCon cells.

原文English
主出版物標題2021 IEEE 48th Photovoltaic Specialists Conference, PVSC 2021
發行者Institute of Electrical and Electronics Engineers Inc.
頁面1971-1976
頁數6
ISBN(電子)9781665419222
DOIs
出版狀態Published - 20 6月 2021
事件48th IEEE Photovoltaic Specialists Conference, PVSC 2021 - Fort Lauderdale, 美國
持續時間: 20 6月 202125 6月 2021

出版系列

名字Conference Record of the IEEE Photovoltaic Specialists Conference
ISSN(列印)0160-8371

Conference

Conference48th IEEE Photovoltaic Specialists Conference, PVSC 2021
國家/地區美國
城市Fort Lauderdale
期間20/06/2125/06/21

指紋

深入研究「Modeling and Understanding of Rear Junction Double-Side Passivated Contact Solar Cells with Selective Area TOPCon on Front」主題。共同形成了獨特的指紋。

引用此