Modeling and Characterization of the Narrow-Width Effect of 4H-SiC MOSFETs With Local Oxidation of SiC Isolation

Chia Lung Hung*, Bing Yue Tsui, Chun Pin Shih, Te Kai Tsai


研究成果: Article同行評審

1 引文 斯高帕斯(Scopus)


In this article, the narrow-width effect (NWE) of 4H-SiC MOSFETs with local oxidation of SiC (LOCOSiC) isolation is reported. A channel width-dependent current hump was observed in the subthreshold region for n-type 4H-SiC MOSFETs with LOCOSiC, and a channel width-dependent threshold voltage (Vth) shift was observed for p-type 4H-SiC MOSFETs with LOCOSiC. This unusual NWE arises from the increase in the gate oxide thickness from the channel center toward the isolation edge and is different from the conventional NWE found in local oxidation of silicon (LOCOS) technology, which arises from the charge stored in the parasitic field oxide (FOX) capacitor and lateral dopant encroachment. A H2O diffusion and oxidation model is proposed in this article to explain the growth of a long bird's beak in 4H-SiC MOSFETs with LOCOSiC. Technology computer-aided design (TCAD) simulations were executed to explore the H2O diffusion behavior of these MOSFETs, and an analytical formula was derived to predict the oxide layer thickness and length of bird's beak along the diffusion path in the H2O diffusion and oxidation model. The problems caused by the long bird's beak and unusual NWE can be overcome by increasing the overetching time of the pad oxide removal and marginally decreasing the thickness of the FOX layer. Therefore, the NWE of the LOCOSiC isolation is expected to be weaker than that of the LOCOS isolation because field implantation is unnecessary, and thus, dopant encroachment does not occur in the LOCOSiC technology.

頁(從 - 到)5742-5748
期刊IEEE Transactions on Electron Devices
出版狀態Published - 1 10月 2022


深入研究「Modeling and Characterization of the Narrow-Width Effect of 4H-SiC MOSFETs With Local Oxidation of SiC Isolation」主題。共同形成了獨特的指紋。